Recommended for inert and reactive gases, these filters offer excellent compatibility with all classes of semiconductor process gases. Use them in gas panels and gas cabinets where ultrapure gas is required for wafer processing.
- Superior particulate filtration for ultrapure gas system filtration
- Low pressure drop reduces the risk of condensation in low vapour pressure gases
- Cleanroom manufactured, welded and tested
- PTFE membranes provide high efficiency filtration
Filter element: hydrophobic PTFE membrane supported by moulded PTFE PFA structure; housing: electropolished 316L stainless steel.
Applications: ozone applications (gas), gas cabinets, ultrapure gas systems, gas panels, valve manifold boxes.
Downstream cleanliness particles: Less than 0,03 particles/liter (<1 particle/0,028 m³) greater than 0,01 μm.
Downstream cleanliness volatiles: <10 ppb moisture.