Orthophosphoric acid ≥85%, CMOS for microelectronic, J.T.Baker®

Supplier: Avantor
Danger

0274-11EA 0 EUR
0274-11 0274-AN
Orthophosphoric acid ≥85%, CMOS for microelectronic, J.T.Baker®
Orthophosphoric acid
Formula: H₃PO₄
MW: 98 g/mol
Melting Pt: 28 °C
Density: 1,71 - 1.87 g/cm³ (25 °C)
MDL Number: MFCD00011340
EINECS: 231-633-2
UN: 1805
ADR: 8,III
Merck Index: 14,08596

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Specification Test Results

For Microelectronic Use
Store at temperatures above 22°C (72°F)
Assay (H₃PO₄) (by acidimetry) 85.0 - 87.0 %
Color (APHA) ≤10
Specific Gravity at 60°/60°F 1.691 - 1.710
Reducing Substances Passes Test
Volatile Acids (µeq/g) ≤0.16
Chloride (Cl) ≤1.0 ppm
Nitrate (NO₃) ≤2 ppm
Sulfate (SO₄) ≤12 ppm
Trace Impurities - Aluminum (Al) ≤0.500 ppm
Trace Impurities - Antimony (Sb) ≤10.000 ppm
Trace Impurities - Arsenic (As) ≤0.050 ppm
Trace Impurities - Calcium (Ca) ≤1.500 ppm
Trace Impurities - Chromium (Cr) ≤0.200 ppm
Trace Impurities - Cobalt (Co) ≤0.050 ppm
Trace Impurities - Copper (Cu) ≤0.050 ppm
Trace Impurities - Gold (Au) ≤0.300 ppm
Trace Impurities - ACS - Heavy Metals (as Pb) ≤5 ppm
Trace Impurities - Iron (Fe) ≤2.0 ppm
Trace Impurities - Lead (Pb) ≤0.300 ppm
Trace Impurities - Lithium (Li) ≤0.100 ppm
Trace Impurities - Magnesium (Mg) ≤0.20 ppm
Trace Impurities - Manganese (Mn) ≤0.100 ppm
Trace Impurities - Nickel (Ni) ≤0.200 ppm
Trace Impurities - Potassium (K) ≤1.500 ppm
Trace Impurities - Sodium (Na) ≤2.500 ppm
Trace Impurities - Strontium (Sr) ≤0.100 ppm
Trace Impurities - Titanium (Ti) ≤0.300 ppm
Trace Impurities - Zinc (Zn) ≤2.000 ppm
Particle Count at point of fill - 0.5 µm and greater
Particle Count at point of fill - 1.0 µm and greater
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